Wst 47.5 B1.92

Biofilm detachment under a dynamic change in shear stress was monitored using Focused Beam Reflectance Measurements (FBRM, LASENTEC®) and mass fractionation. An annular reactor was used to grow biofilm with glucose as substrate. Changing the rotational speed on the inner cylinder of the annular reactor from 150 RPM to 420 RPM induced a step increase in shear stress. It was observed that the rate of detachment increased rapidly after increasing shear stress and then returned to the previous level. Erosion was the dominant process of detachment under steady state operation, whereas sloughing was dominant following the sudden increase in shear stress. After reaching steady state detachment under high shear conditions, the rotational speed was decreased for a 12-hour period. During this brief period of lower shear, the biofilm adjusted to this new condition. When the shear stress was increased again, another sharp increase in effluent solids concentration was observed. A decrease in density indicates that the biofilm became more vulnerable to shear stress after being subjected to this short period of low shear.